LEEM/PEEM/LEED measurements:
Imaging modes:
- Bright-field and Dark-field Low-Energy Electron Microscopy (BF/DF-LEEM).
- Mirror Electron Microscopy (MEM).
- UV-Photoemission Electron Microsocpy (UV PEEM).
- Low Energy Electron Diffraction (LEED).
Specifications :
- Field of view: 2 mm - 150 mm.
- Lateral resolution resolution in LEEM mode: <10nm.
- Vertical resolution: atomic resolution i.e. able for monoatomic steps imaging.
- Electron energy: 0 to 500 eV.
- XY motion range of the sample: ±5mm.
- Variable sample temperature : ~150 K to 2000 K.
- Heating:
- Radiative up to 773 K.
- E-beam heating (up to 2000 K) wiht PID temperature control.
- Cooling: LN2 down to ~150 K.
- Temperature measurement: C-type thermocouple (W5%Re/W26%Re) spot-welded on the sample holder.
- Temporal resolution: up to 20 frames per second with exposure time 0.01 sec per frame..
- UV light source for UV-PEEM: Hg arc lamp with cut off energy 5.2 eV, Newport.
- Detector: Microchannel plate (Photonis)+CCD camera (Hamamatsu).
- Base pressure: 2×10-10 Torr.
In-situ MBE synthesis in LEEM:
- Electron beam evaporators:
- EFM 3, Focus GmbH (Max temperature: 3773K).
- Futec, Electron Beam Evaporator -1 (Max temperature: 3873 K).
*The source material can be replaced without venting the main chamber.
- Knudsen cells:
- HTEZ, MBE Komponenten (Max temperature: 2173 K).
- K-Cell Evaporator-1, FUTEC (Max temperature: 1473 K).
- 2x Homemade low-temeprature K-cells for C60 / alkali metals (currently K and Li) evaporation.
- Gas dosing:
- 3 leak valves for O2 H2 and N2 gases.
- RF atom source:
- HD25, Oxford Applied Research souitable for H2, N2 and Ar.
Other: RGA 100, Stanford Research Systems.
Preparation chamber:
- Sputter gun:
- IG 2, RBD Instruments.Sputtering with Argon ions up to 2000 eV.
- Heating:
- Radiative up to 773 K.
- E-beam heating (up to 2000 K) with PID temperature control.
- Gas dosing:
- One leak valve for Ar gas dosing.
- Knudsen cells:
- K-Cell Evaporator-1, FUTEC (Max temperature: 1473 K).
- Homemade low-temperature K-cells for alkali metals (currently K and Li) evaporation.
- Device fabrication stage:
- In-situ device fabrication stage, FUTEC.
- Sample storage capacity: 3 samples.
- Base pressure: 9×10-10 Torr .
In-situ transport measurements chamber:
- Transport measurements:
- In-situ transport measurement stage (4-point probe, mutual inductance, Hall bar), FUTEC.
- 4K Cryostat, Advanced Research Systems.
- Sample storage capacity: 5 samples.
- Base pressure: 9×10-10 Torr .